Measuring Material, Dopant Loss From Post-Implant Wafer Cleans ... by Silicon nanoparticles

Thu, 16 Jul 2009 14:23:37 -0700

Measuring Material, Dopant Loss From Post-Implant Wafer Cleans ...

by Silicon nanoparticles @ Thu, 16 Jul 2009 14:23:37 -0700

Likewise, for some lower-energy and/or lower-dose implant levels, plasma strip with non-oxidizing chemistries have been found to reduce silicon oxidation, but could reduce cleaning efficiency, depending on implant conditions. ...

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